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Extraction of exposure modeling parameters of thick resist

Author(s):
Liu, C. ( Sichuan Univ. (China) )
Du, J. ( Sichuan Univ. (China) )
Liu, S. ( Shanxi Univ. of Technology (China) )
Duan, X. ( Sichuan Univ. (China) )
Luo, B. ( Sichuan Univ. (China) )
Zhu, J. ( Sichuan Univ. (China) )
Guo, Y. ( Sichuan Univ. (China) )
Du, C. ( State Key Lab. of Optical Technology on Microfabrication, CAS (China) )
3 more
Publication title:
MEMS/MOEMS Technologies and Applications II
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5641
Pub. Year:
2004
Page(from):
333
Page(to):
343
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455963 [0819455962]
Language:
English
Call no.:
P63600/5641
Type:
Conference Proceedings

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