3D align overlay verification using glass wafers
- Author(s):
- Smeets, E. M. J. ( ASML Special Applications (Netherlands) )
- Bijnen, F. G. C. ( ASML Special Applications (Netherlands) )
- Slabbekoorn, J. ( Technische Univ. Delft (Netherlands) )
- van Zeijl, H. W. ( Technische Univ. Delft (Netherlands) )
- Publication title:
- MEMS/MOEMS Technologies and Applications II
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5641
- Pub. Year:
- 2004
- Page(from):
- 152
- Page(to):
- 162
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455963 [0819455962]
- Language:
- English
- Call no.:
- P63600/5641
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Characterization of waferstepper and process related front- to backwafer overlay errors in bulk micromachining using electrical overlay test structures
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Characterization of front- to backwafer alignment and bulk micromachining using electrical overlay test structures
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Performance study of new segmented overlay marks for advanced wafer processing
SPIE-The International Society for Optical Engineering |
Materials Research Society |
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Optimization of align marks and overlay targets in VIA first dual damascene process
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Laser photoacoustical detection of trace gases applied to respiration of arthropods
Society of Photo-optical Instrumentation Engineers |
12
Conference Proceedings
OPC and verification accuracy enhancement using the 2D wafer image for the low kl memory devices [6154-19]
SPIE - The International Society of Optical Engineering |