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Origin mechanism of residual stresses in porous silicon film (Invited Paper)

Author(s):
  • Lei, Z. ( Tianjin Univ. (China) and Dalian Univ. of Technology (China) )
  • Kang, Y. ( Tianjin Univ. (China) )
  • Hu, M. ( Tianjin Univ. (China) )
  • Qiu, Y. ( Tianjin Univ. (China) )
  • Cen, H. ( Tianjin Univ. (China) )
Publication title:
MEMS/MOEMS Technologies and Applications II
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5641
Pub. Year:
2004
Page(from):
116
Page(to):
123
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455963 [0819455962]
Language:
English
Call no.:
P63600/5641
Type:
Conference Proceedings

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