Blank Cover Image

Nanostructure generation based on laser cooling and mechanical mask

Author(s):
  • Chen, X. Z. ( Institute of Optics and Electronics, CAS (China) )
  • Xing, T. W. ( Institute of Optics and Electronics, CAS (China) )
  • Shi, J. P. ( Institute of Optics and Electronics, CAS (China) )
  • Chen, X. N. ( Institute of Optics and Electronics, CAS (China) )
  • Yao, H. M. ( Institute of Optics and Electronics, CAS (China) )
Publication title:
Nanophotonics, Nanostructure, and Nanometrology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5635
Pub. Year:
2004
Page(from):
254
Page(to):
261
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455901 [0819455903]
Language:
English
Call no.:
P63600/5635
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Theoretical analysis of atom focusing for nanostructure fabrication

Chen, X. Z., Xing, T. W., Yu, G. B., Chen, X. N., Yao, H. M.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Resolution enhancement in optical lithography with chromium wire-grid polarization mask

Yu, G., Lin, W., Xing, T., Yao, H.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Resolution enhancement in optical lithography using polarized film mask

Yu, G., Lin, W., Chen, X., Xing, T., Yao, H.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond

Hsu, S.D., Corcoran, N.P., Eurlings, M., Knose, W.T., Laidig, T.L., Wampler, K.E., Roy, S., Shi, X., Hsu, C.M., Chen, …

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Thermal Stability of Nanocrystalline Ti6Al4V Produced by Surface Mechanical Attrition Treatment

Q.T. Yao, M.N. Xing, G.L. Zhang, W.P. Tong

Trans Tech Publications
9 Conference Proceedings Lihtography process optimization for 130-nm polygate mask and the impact of mask error factor

Hsu,S., Shi,X., Socha,R.J., Chen,J.F., Yee,J.C., Anath,M., Desai,S., Imamura,P.H., Sherrill,M.J., Tseng,Y.C., …

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Application of Sigma7500 pattern generator to X architecture and 45-nm generation mask making

M. -J. Yao, T. -Y. Wang, C. -J. Chen, H. -C. Lee, Y.-C. Ku

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask

Chen, J.F., Van Den Broeke, D.J., Hsu, M., Laidig, T.L., Wampler, K.E., Shi, X., Hsu, S., Shafer, T.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Contact and via hole mask design optimization for 65-nm technology node

Van Den Broeke, D., Shi, X., Socha, R., Laidig, T., Hollerbach, U., Wampler, K. E., Hsu, S., Chen, J. F., Corcoran, N. …

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Resolution enhancement with high-transmission attenuating phase-shift masks

Socha, R. J., Conley, W. E., Shi, X., Dusa, M. V., Petersen, J. S., Chen, F., Wampler, K. E., Laidig, T. L., Caldwell, …

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Numerical simulation of the mechanical properties of 40Cr steel during laser quenching

Li, Z. L., Cheng, H. M., Chen, J. R., Wei, J. T., Ge, X. W.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Embedded system of image storage based on fiber channel

X. Chen, W. Su, Z. Xing, H. Wang

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12