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Self-assembled ultralow-k porous silica films for 45-nm node technology (Invited Paper)

Author(s):
Kikkawa, T. ( Hiroshima Univ. (Japan) and National Institute of Advanced Industrial Science and Technology (Japan) )
Oku, Y. ( Association of Super-Advanced Electronics Technolgies (Japan) )
Kohmura, K. ( Association of Super-Advanced Electronics Technolgies (Japan) )
Fujii, N. ( Association of Super-Advanced Electronics Technolgies (Japan) )
Tanaka, H. ( Association of Super-Advanced Electronics Technolgies (Japan) )
Ishikawa, A. ( Association of Super-Advanced Electronics Technolgies (Japan) )
Matsuo, H. ( Association of Super-Advanced Electronics Technolgies (Japan) )
Sonoda, Y. ( Association of Super-Advanced Electronics Technolgies (Japan) )
Miyoshi, H. ( Association of Super-Advanced Electronics Technolgies (Japan) )
Goto, T. ( Association of Super-Advanced Electronics Technolgies (Japan) )
Hata, N. ( National Institute of Advanced Industrial Science and Technology (Japan) )
Seino, Y. ( National Institute of Advanced Industrial Science and Technology (Japan) )
Takada, S. ( National Institute of Advanced Industrial Science and Technology (Japan) )
Yoshino, T. ( National Institute of Advanced Industrial Science and Technology (Japan) )
Kinoshita, K. ( Association of Super-Advanced Electronics Technolgies (Japan) )
10 more
Publication title:
Nanofabrication: Technologies, Devices, and Applications
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5592
Pub. Year:
2005
Page(from):
153
Page(to):
157
Pages:
5
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455451 [0819455458]
Language:
English
Call no.:
P63600/5592
Type:
Conference Proceedings

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