Blank Cover Image

Evaluation of dry etching and defect repair of EUVL mask absorber layer

Author(s):
Abe, T. ( Dai Nippon Printing Co., Ltd. (Japan) )
Amano, T. ( Dai Nippon Printing Co., Ltd. (Japan) )
Motonaga, T. ( Dai Nippon Printing Co., Ltd. (Japan) )
Sasaki, S. ( Dai Nippon Printing Co., Ltd. (Japan) )
Mohri, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )
Tanaka, Y. ( Association of Super-Advanced Electronics Technologies (Japan) )
Nishiyama, I. ( Association of Super-Advanced Electronics Technologies (Japan) )
3 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
1435
Page(to):
1444
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-2
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Evaluation of defect repair of EUV mask absorber layer [5853-74]

Abe, T., Amano, T., Mohri, H., Hayashi, N., Tanaka, Y., Kumasaka, F., Nishiyama, I.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Dry etching of Ta absorber for EUVL masks

Hoshino,E., Ogawa,T., Hirano,N., Hoko,H., Takahashi,M., Yamanashi,H., Chiba,A., Ito,M., Okazaki,S.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Study of mask process development for EUVL

Abe, T., Nishiguchi, M., Amano, T., Motonaga, T., Sasaki, S., Mohri, H., Hayashi, N., Tanaka, Y., Yamanashi, H., …

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Mask CD measurements with an atomic force microscope

Yoshida, Y., Sasaki, S., Abe, T., Mohri, H., Hayashi, N.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Evaluation of multilayer damage in EUVL mask fabrication process

Tanaka, Y., Nishiyama, I., Abe, T., Sasaki, S., Hayashi, N.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Development of EUV mask fabrication process using Ru capping blank

T. Abe, T. Adachi, S. Sasaki, H. Mohri, N. Hayashi

Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Evaluation of defect repair of EUVL mask pattern using FIB-GAE method

T. Amano, Y. Nishiyama, H. Shigemura, T. Terasawa, O. Suga

Society of Photo-optical Instrumentation Engineers
10 Conference Proceedings Study of EUVL mask defect repair using FIB-GAE method

T. Amano, Y. Nishiyama, H. Shigemura, T. Terasawa, O. Suga

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings EUV absorbance and dry-etching characteristics of TaGeN films for EUVL mask absorber

Tanaka, Y., Kim, D., Yamanashi, H., Nishiyama, I.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Dry etch technology development for NIL template [6283-87]

Yoshida, Y., Amano, T., Sasaki, S., Itoh, K., Toyama, N., Mohri, H., Hayashi, N.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings EUV mask development status at ASET and DNP [6283-92]

Abe, T., Fujii, A., Mohri, H., Hayashi, N., Tanaka, Y., Nishiyama, I.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Defect inspection and repair performance on CPL masks for 90- and 65-nm node line patterns

Morikawa, Y., Kojima, K., Hashimoto, H., Yoshida, Y., Sasaki, S., Mohri, H., Hayashi, N.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12