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Evaluation of multilayer damage in EUVL mask fabrication process

Author(s):
  • Tanaka, Y. ( Association of Super-Advanced Electronics Technologies (Japan) )
  • Nishiyama, I. ( Association of Super-Advanced Electronics Technologies (Japan) )
  • Abe, T. ( Dai Nippon Printing Co., Ltd. (Japan) )
  • Sasaki, S. ( Dai Nippon Printing Co., Ltd. (Japan) )
  • Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
1377
Page(to):
1384
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-2
Type:
Conference Proceedings

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