Evaluation of overlay accuracy of phase-shift image for 65-nm node masks

Evaluation of overlay accuracy of phase-shift image for 65-nm node masks

Author(s):

Komagata, T. ( JEOL USA, Inc. (USA) )
Kimura, N. ( JEOL Ltd. (Japan) )
Funaki, K. ( JEOL Ltd. (Japan) )
Nakagawa, Y. ( JEOL Ltd. (Japan) )
Gotoh, N. ( JEOL Ltd. (Japan) )

Publication title:

24th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5567

Pub. Year:

2004

Page(from):

1315

Page(to):

1322

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

Language:

English

Call no.:

P63600/5567-2

Type:

Conference Proceedings

Details

TDL ID:	ZA00014770
Series ID:	PA00000029
Conf. info. (Name):	Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2004 : 24th
Conf. info. (Venue):	Monterey, CA, USA
Conf. info. (Date):	2004.09.14-2004.09.17

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