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Characterization of 193-nm resists for optical mask manufacturing

Author(s):
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. date:
2004
Page(from):
1256
Page(to):
1267
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-2
Type:
Conference Proceedings

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