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First photomask developer based on state-of-the-art wafer processing technology

Author(s):
Tichy, P. ( Tokyo Electron Ltd. (Japan) )
Fukai, T. ( Tokyo Electron Ltd. (Japan) )
Kamei, S. ( Tokyo Electron Ltd. (Japan) )
Asai, H. ( Tokyo Electron Ltd. (Japan) )
Kotoda, T. ( Tokyo Electron Ltd. (Japan) )
Takeshita, K. ( Tokyo Electron Ltd. (Japan) )
Miyamoto, T. ( Tokyo Electron Ltd. (Japan) )
Okamoto, Y. ( Tokyo Electron Ltd. (Japan) )
Funakoshi, H. ( Tokyo Electron Ltd. (Japan) )
Koga, S. ( Tokyo Electron Ltd. (Japan) )
Oono, S. ( Tokyo Electron Ltd. (Japan) )
Cantrell, R. ( Advanced Mask Technology Ctr. (Germany) )
Feicke, A. ( Advanced Mask Technology Ctr. (Germany) )
Porsche, W. ( Advanced Mask Technology Ctr. (Germany) )
Tschinkl, M. ( Advanced Mask Technology Ctr. (Germany) )
Lee, G. ( Advanced Mask Technology Ctr. (Germany) )
11 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
1216
Page(to):
1227
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-2
Type:
Conference Proceedings

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