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Enhancement of unified mask data formats for EB writers

Author(s):
Suzuki, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Hirumi, J. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Hojyo, Y. ( Hitachi High-Technologies Corp. (Japan) )
Kawase, Y. ( JEOL Ltd. (Japan) )
Sakamoto, S. ( NuFlare Technology Inc. (Japan) )
Kuriyama, K. ( Dai Nippon Printing Co., Ltd. (Japan) )
Narukawa, S. ( Dai Nippon Printing Co., Ltd. (Japan) )
Houga, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
4 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
1186
Page(to):
1194
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-2
Type:
Conference Proceedings

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