Advanced photomask repair technology for 65-nm lithography: II

Advanced photomask repair technology for 65-nm lithography: II

Author(s):

Itou, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Tanaka, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Sugiyama, Y. ( SII NanoTechnology Inc. (Japan) )

Hagiwara, R. ( SII NanoTechnology Inc. (Japan) )

Takahashi, H. ( SII NanoTechnology Inc. (Japan) )

Takaoka, O. ( SII NanoTechnology Inc. (Japan) )

Kozakai, T. ( SII NanoTechnology Inc. (Japan) )

Matsuda, O. ( SII NanoTechnology Inc. (Japan) )

Suzuki, K. ( SII NanoTechnology Inc. (Japan) )

Okabe, M. ( SII NanoTechnology Inc. (Japan) )

Kikuchi, S. ( SII NanoTechnology Inc. (Japan) )

Uemoto, A. ( SII NanoTechnology Inc. (Japan) )

Yasaka, A. ( SII NanoTechnology Inc. (Japan) )

Adachi, T. ( SII NanoTechnology Inc. (Japan) )

Nishida, N. ( HOYA Corp. (Japan) )

Ozawa, T. ( HOYA Corp. (Japan) )

12 more

Publication title:

24th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5567

Pub. Year:

2004

Page(from):

1132

Page(to):

1143

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

Language:

English

Call no.:

P63600/5567-2

Type:

Conference Proceedings

Details

TDL ID:	ZA00014770
Series ID:	PA00000029
Conf. info. (Name):	Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2004 : 24th
Conf. info. (Venue):	Monterey, CA, USA
Conf. info. (Date):	2004.09.14-2004.09.17

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