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Advanced photomask repair technology for 65-nm lithography: II

Author(s):
Itou, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Tanaka, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Sugiyama, Y. ( SII NanoTechnology Inc. (Japan) )
Hagiwara, R. ( SII NanoTechnology Inc. (Japan) )
Takahashi, H. ( SII NanoTechnology Inc. (Japan) )
Takaoka, O. ( SII NanoTechnology Inc. (Japan) )
Kozakai, T. ( SII NanoTechnology Inc. (Japan) )
Matsuda, O. ( SII NanoTechnology Inc. (Japan) )
Suzuki, K. ( SII NanoTechnology Inc. (Japan) )
Okabe, M. ( SII NanoTechnology Inc. (Japan) )
Kikuchi, S. ( SII NanoTechnology Inc. (Japan) )
Uemoto, A. ( SII NanoTechnology Inc. (Japan) )
Yasaka, A. ( SII NanoTechnology Inc. (Japan) )
Adachi, T. ( SII NanoTechnology Inc. (Japan) )
Nishida, N. ( HOYA Corp. (Japan) )
Ozawa, T. ( HOYA Corp. (Japan) )
12 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. date:
2004
Page(from):
1132
Page(to):
1143
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-2
Type:
Conference Proceedings

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