Printability evaluation for 800-nm contact hole with repaired patterns according to exposing condition
- Author(s):
Kim, S. P. ( Hynix Semiconductor, Inc. (South Korea) ) Kim, S. C. ( Hynix Semiconductor, Inc. (South Korea) ) Kim, H. C. ( Hynix Semiconductor, Inc. (South Korea) ) Lee, S. I. ( Hynix Semiconductor, Inc. (South Korea) ) Choi, Y. K. ( Hynix Semiconductor, Inc. (South Korea) ) Han, O. ( Hynix Semiconductor, Inc. (South Korea) ) - Publication title:
- 24th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5567
- Pub. Year:
- 2004
- Page(from):
- 1091
- Page(to):
- 1098
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455130 [081945513X]
- Language:
- English
- Call no.:
- P63600/5567-2
- Type:
- Conference Proceedings
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