Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance

Author(s):

Tojo, T. ( Toshiba Corp. (Japan), Topcon Corp. (Japan), and MIRAl, AIST (Japan) )

Hirano, R. ( Toshiba Corp. (Japan) and MIRAl. AIST (Japan) )

Tsuchiya, H. ( Toshiba Corp. (Japan) )

Oaki, J. ( Toshiba Corp. (Japan) )

Nishizaka, T. ( Toshiba Corp. (Japan) )

Sanada, Y. ( Toshiba Corp. (Japan) )

Matsuki, K. ( Toshiba Corp. (Japan) )

Isomura, I. ( Toshiba Corp. (Japan) )

Ogawa, R. ( Toshiba Corp. (Japan) )

Kobayashi, N. ( Toshiba Corp. (Japan) )

Nakashima, K. ( Toshiba Corp. (Japan) )

Sugihara, S. ( Toshiba Corp. (Japan) )

Inoue, H. ( Toshiba Corp. (Japan) )

Imai, S. ( Toshiba Corp. (Japan) )

Suzuki, H. ( Topcon Corp. (Japan) )

Sekine, A. ( Topcon Corp. (Japan) )

Taya, M. ( Topcon Corp. (Japan) )

Miwa, A. ( Topcon Corp. (Japan) )

Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Ohira, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Chung, D. -H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Otaki, M. ( Toppan Printing Co., Ltd. (Japan) )

17 more

Publication title:

24th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5567

Pub. Year:

2004

Page(from):

1011

Page(to):

1023

Pages:

13

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

Language:

English

Call no.:

P63600/5567-2

Type:

Conference Proceedings