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R-mask: simple and low-cost fabrication techniques

Author(s):
Fujii, A. ( Dai Nippon Printing Co., Ltd. (Japan) )
Sasaki, S. ( Dai Nippon Printing Co., Ltd. (Japan) )
Shimizu, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
Kobayashi, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )
Tominaga, T. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hoga, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
Mohri, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hayano, K. ( Hitachi, Ltd. (Japan) )
Hasegawa, N. ( Hitachi, Ltd. (Japan) )
Hosono, K. ( Renesas Technology Corp. (Japan) )
Arai, T. ( Hitachi, Ltd. (Japan) )
7 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
960
Page(to):
967
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-2
Type:
Conference Proceedings

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