Reticle CD-SEM for 65-nm technology node and beyond

Reticle CD-SEM for 65-nm technology node and beyond

Author(s):

Schlueter, G. W. B. ( Leica Microsystems Semiconductor GmbH (Germany) )
Nakamura, T. ( Advantest Corp. (Japan) )
Matsumoto, J. ( Advantest Corp. (Japan) )
Seyama, M. ( Advantest Corp. (Japan) )
Whittey, J. M. ( Leica Microsystems Inc. (USA) )

Publication title:

24th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5567

Pub. Year:

2004

Page(from):

876

Page(to):

886

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

Language:

English

Call no.:

P63600/5567-2

Type:

Conference Proceedings

Details

TDL ID:	ZA00014770
Series ID:	PA00000029
Conf. info. (Name):	Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2004 : 24th
Conf. info. (Venue):	Monterey, CA, USA
Conf. info. (Date):	2004.09.14-2004.09.17

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