Inspection and repair issues for Step-and-Flash Imprint Lithography templates
- Author(s):
Nordquist, K. J. ( Motorola Labs. (USA) ) Dauksher, W. J. ( Motorola Labs. (USA) ) Mancini, D. P. ( Motorola Labs. (USA) ) Resnick, D. J. ( Motorola Labs. (USA) ) Hess, H. F. ( KLA-Tencor Corp. (USA) ) Pettibone, D. W. ( KLA-Tencor Corp. (USA) ) Adler, D. ( KLA-Tencor Corp. (USA) ) Bertsche, K. ( KLA-Tencor Corp. (USA) ) White, R. ( RAVE LLC (USA) ) Csuy, J. E. ( RAVE LLC (USA) ) Lee, D. ( RAVE LLC (USA) ) - Publication title:
- 24th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5567
- Pub. Year:
- 2004
- Page(from):
- 853
- Page(to):
- 863
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455130 [081945513X]
- Language:
- English
- Call no.:
- P63600/5567-2
- Type:
- Conference Proceedings
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