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Inspection and repair issues for Step-and-Flash Imprint Lithography templates

Author(s):
Nordquist, K. J. ( Motorola Labs. (USA) )
Dauksher, W. J. ( Motorola Labs. (USA) )
Mancini, D. P. ( Motorola Labs. (USA) )
Resnick, D. J. ( Motorola Labs. (USA) )
Hess, H. F. ( KLA-Tencor Corp. (USA) )
Pettibone, D. W. ( KLA-Tencor Corp. (USA) )
Adler, D. ( KLA-Tencor Corp. (USA) )
Bertsche, K. ( KLA-Tencor Corp. (USA) )
White, R. ( RAVE LLC (USA) )
Csuy, J. E. ( RAVE LLC (USA) )
Lee, D. ( RAVE LLC (USA) )
6 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
853
Page(to):
863
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-2
Type:
Conference Proceedings

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