Comparative study of mask architectures for EUV lithography

Comparative study of mask architectures for EUV lithography

Author(s):

Pawloski, A. R. ( Advanced Micro Devices, Inc. (USA) )

La Fontaine, B. ( Advanced Micro Devices, Inc. (USA) )

Levinson, H. J. ( Advanced Micro Devices, Inc. (USA) )

Hirscher, S. ( Infineon Technologies AG (Germany) )

Schwarzl, S. ( Infineon Technologies AG (Germany) )

Lowack, K. ( Infineon Technologies AG (Germany) )

Kamm, F. -M. ( Infineon Technologies AG (Germany) )

Bender, M. ( Infineon Technologies AG (Germany) )

Domke, W. -D. ( Infineon Technologies AG (Germany) )

Holfeld, C. ( Advanced Mask Technology Ctr. GmbH & Co. KG (Germany) )

Dersch, U. ( Advanced Mask Technology Ctr. GmbH & Co. KG (Germany) )

Naulleau, P. ( Lawrence Berkeley National Lab. (USA) )

Letzkus, F. ( IMS Chips (Germany) )

Butschke, J. ( IMS Chips (Germany) )

9 more

Publication title:

24th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5567

Pub. Year:

2004

Page(from):

762

Page(to):

773

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

Language:

English

Call no.:

P63600/5567-2

Type:

Conference Proceedings

Details

TDL ID:	ZA00014770
Series ID:	PA00000029
Conf. info. (Name):	Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2004 : 24th
Conf. info. (Venue):	Monterey, CA, USA
Conf. info. (Date):	2004.09.14-2004.09.17

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