
Double dipole lithography for 65-nm node and beyond: defect sensitivity characterization and reticle inspection
- Author(s):
Hsu, S. ( ASML MaskTools, Inc. (USA) ) Chu, T. -B. ( ASML TDC Asia (Taiwan) ) Van Den Broeke, D. ( ASML MaskTools, Inc. (USA) ) Chen, J. F. ( ASML MaskTools, Inc. (USA) ) Hsu, M. ( ASML MaskTools, Inc. (USA) ) Corcoran, N. P. ( ASML MaskTools, Inc. (USA) ) Volk, W. ( KLA-Tencor Corp. (USA) ) Ruch, W. E. ( KLA-Tencor Corp. (USA) ) Sier, J. -P. ( KLA-Tencor Corp. (USA) ) Hess, C. E. ( KLA-Tencor Corp. (USA) ) Lin, B. ( United Microelectronics Corp. (Taiwan) ) Yu, C. C. ( United Microelectronics Corp. (Taiwan) ) Huang, G. ( United Microelectronics Corp. (Taiwan) ) - Publication title:
- 24th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5567
- Pub. Year:
- 2004
- Page(from):
- 711
- Page(to):
- 722
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455130 [081945513X]
- Language:
- English
- Call no.:
- P63600/5567-1
- Type:
- Conference Proceedings
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