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Double dipole lithography for 65-nm node and beyond: defect sensitivity characterization and reticle inspection

Author(s):
Hsu, S. ( ASML MaskTools, Inc. (USA) )
Chu, T. -B. ( ASML TDC Asia (Taiwan) )
Van Den Broeke, D. ( ASML MaskTools, Inc. (USA) )
Chen, J. F. ( ASML MaskTools, Inc. (USA) )
Hsu, M. ( ASML MaskTools, Inc. (USA) )
Corcoran, N. P. ( ASML MaskTools, Inc. (USA) )
Volk, W. ( KLA-Tencor Corp. (USA) )
Ruch, W. E. ( KLA-Tencor Corp. (USA) )
Sier, J. -P. ( KLA-Tencor Corp. (USA) )
Hess, C. E. ( KLA-Tencor Corp. (USA) )
Lin, B. ( United Microelectronics Corp. (Taiwan) )
Yu, C. C. ( United Microelectronics Corp. (Taiwan) )
Huang, G. ( United Microelectronics Corp. (Taiwan) )
8 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. date:
2004
Page(from):
711
Page(to):
722
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-1
Type:
Conference Proceedings

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