Double dipole lithography for 65-nm node and beyond: defect sensitivity characterization and reticle inspection

Double dipole lithography for 65-nm node and beyond: defect sensitivity characterization and reticle inspection

Author(s):

Hsu, S. ( ASML MaskTools, Inc. (USA) )

Chu, T. -B. ( ASML TDC Asia (Taiwan) )

Van Den Broeke, D. ( ASML MaskTools, Inc. (USA) )

Chen, J. F. ( ASML MaskTools, Inc. (USA) )

Hsu, M. ( ASML MaskTools, Inc. (USA) )

Corcoran, N. P. ( ASML MaskTools, Inc. (USA) )

Volk, W. ( KLA-Tencor Corp. (USA) )

Ruch, W. E. ( KLA-Tencor Corp. (USA) )

Sier, J. -P. ( KLA-Tencor Corp. (USA) )

Hess, C. E. ( KLA-Tencor Corp. (USA) )

Lin, B. ( United Microelectronics Corp. (Taiwan) )

Yu, C. C. ( United Microelectronics Corp. (Taiwan) )

Huang, G. ( United Microelectronics Corp. (Taiwan) )

8 more

Publication title:

24th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5567

Pub. Year:

2004

Page(from):

711

Page(to):

722

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

Language:

English

Call no.:

P63600/5567-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014769
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2004 : 24th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2004.09.14-2004.09.17

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