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Effect of UV/O3 treatment on mask surface to reducing sulfuric residue ions

Author(s):
Lee, D. W. ( Hynix Semiconductor, Inc. (South Korea) )
Jung, H. Y. ( Hynix Semiconductor, Inc. (South Korea) )
Kim, M. S. ( Hynix Semiconductor, Inc. (South Korea) )
Lee, J. S. ( Hynix Semiconductor, Inc. (South Korea) )
Choi, Y. K. ( Hynix Semiconductor, Inc. (South Korea) )
Han, O. ( Hynix Semiconductor, Inc. (South Korea) )
1 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
521
Page(to):
528
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-1
Type:
Conference Proceedings

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