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Pellicle choice for 193-nm immersion lithography photomasks

Author(s):
Cotte, E. P. ( Advanced Mask Technology Ctr. (Germany) )
HaBler, R. ( Institut fur Polymerforschung Dresden (Germany) )
Utess, B. ( Advanced Mask Technology Ctr. (Germany) )
Antesberger, G. ( Advanced Mask Technology Ctr. (Germany) )
Kromer, F. ( Advanced Mask Technology Ctr. (Germany) )
Teuber, S. ( Advanced Mask Technology Ctr. (Germany) )
1 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
511
Page(to):
520
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-1
Type:
Conference Proceedings

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