Pellicle choice for 193-nm immersion lithography photomasks
- Author(s):
Cotte, E. P. ( Advanced Mask Technology Ctr. (Germany) ) HaBler, R. ( Institut fur Polymerforschung Dresden (Germany) ) Utess, B. ( Advanced Mask Technology Ctr. (Germany) ) Antesberger, G. ( Advanced Mask Technology Ctr. (Germany) ) Kromer, F. ( Advanced Mask Technology Ctr. (Germany) ) Teuber, S. ( Advanced Mask Technology Ctr. (Germany) ) - Publication title:
- 24th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5567
- Pub. Year:
- 2004
- Page(from):
- 511
- Page(to):
- 520
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455130 [081945513X]
- Language:
- English
- Call no.:
- P63600/5567-1
- Type:
- Conference Proceedings
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