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Resist model calibration using 2D developed patterns for low-k1 process optimization and wafer printing predictions

Author(s):
Chen, T. ( ASML MaskTools, Inc. (USA) )
Van Den Broeke, D. ( ASML MaskTools, Inc. (USA) )
Park, S. ( ASML MaskTools, Inc. (USA) )
Liebchen, A. ( ASML MaskTools, Inc. (USA) )
Chen, J. F. ( ASML MaskTools, Inc. (USA) )
Hsu, S. ( ASML MaskTools, Inc. (USA) )
Park, J. C. ( ASML MaskTools, Inc. (USA) )
Yu, L. ( ASML MaskTools, Inc. (USA) )
Gronlund, K. ( ASML MaskTools, Inc. (USA) )
4 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. date:
2004
Page(from):
434
Page(to):
444
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-1
Type:
Conference Proceedings

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