The impact of mask topography on binary reticles at the 65-nm node

The impact of mask topography on binary reticles at the 65-nm node

Author(s):

Smith, M. D. ( KLA-Tencor Corp. (USA) )
Byers, J. D. ( KLA-Tencor Corp. (USA) )
Mack, C. A. ( KLA-Tencor Corp. (USA) )

Publication title:

24th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5567

Pub. Year:

2004

Page(from):

416

Page(to):

424

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

Language:

English

Call no.:

P63600/5567-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014769
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2004 : 24th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2004.09.14-2004.09.17

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