Phase-defocus windows for alternating phase-shifting mask
- Author(s):
Liang, F. -J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Chen, C. -K. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Shin, J. -J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) You, J. -W. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lin, C. -H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Pan, Z. -Y. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Shu, K. -C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Gau, T. -S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lin, B. J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) - Publication title:
- 24th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5567
- Pub. Year:
- 2004
- Page(from):
- 406
- Page(to):
- 415
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455130 [081945513X]
- Language:
- English
- Call no.:
- P63600/5567-1
- Type:
- Conference Proceedings
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