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Phase-defocus windows for alternating phase-shifting mask

Author(s):
Liang, F. -J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chen, C. -K. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Shin, J. -J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
You, J. -W. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, C. -H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Pan, Z. -Y. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Shu, K. -C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Gau, T. -S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, B. J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
4 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. date:
2004
Page(from):
406
Page(to):
415
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-1
Type:
Conference Proceedings

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