PMJ (Photomask Japan) 2004 panel overview: Issues on mask technology for 65-nm lithography with ArF (Invited Paper)

PMJ (Photomask Japan) 2004 panel overview: Issues on mask technology for 65-nm lithography with ArF (Invited Paper)

Author(s):: Watanabe, H. ( Matsushita Electric Industrial Co., Ltd. (Japan) ) , ( Toshiba Corp. (Japan) )
Publication title:: 24th Annual BACUS Symposium on Photomask Technology
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 5567
Pub. Year:: 2004
Page(from):: 308
Page(to):: 317
Pages:: 10
Pub. info.:: Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819455130 [081945513X]
Language:: English
Call no.:: P63600/5567-1
Type:: Conference Proceedings

Details

TDL ID:	ZA00014769
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2004 : 24th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2004.09.14-2004.09.17

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