FEP-171 resist thickness optimization and dry etch screening on NTAR7 chrome substrates for Sigma7300 DUV laser pattern generator

FEP-171 resist thickness optimization and dry etch screening on NTAR7 chrome substrates for Sigma7300 DUV laser pattern generator

Author(s):

Karlsson, J. O. ( Micronic Laser Systems AB (Sweden) )

Xing, K. ( Micronic Laser Systems AB (Sweden) )

Bajramovic, A. ( Micronic Laser Systems AB (Sweden) )

Dahlberg, H. ( Micronic Laser Systems AB (Sweden) )

Bjornberg, C. ( Micronic Laser Systems AB (Sweden) )

Hogfeldt, P. ( Micronic Laser Systems AB (Sweden) )

Kjellberg, L. ( Micronic Laser Systems AB (Sweden) )

Fosshaug, H. ( Micronic Laser Systems AB (Sweden) )

Dahlberg, A. ( Micronic Laser Systems AB (Sweden) )

Lundvall, A. ( Micronic Laser Systems AB (Sweden) )

5 more

Publication title:

24th Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5567

Pub. Year:

2004

Page(from):

234

Page(to):

244

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819455130 [081945513X]

Language:

English

Call no.:

P63600/5567-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014769
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2004 : 24th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	2004.09.14-2004.09.17

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