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High flow rate development: process optimization using megasonic immersion development (MID)

Author(s):
  • Courboin, D. ( DuPont Photomasks Korea Ltd. (South Korea) )
  • Choi, J. W. ( DuPont Photomasks Korea Ltd. (South Korea) )
  • Jung, S. H. ( DuPont Photomasks Korea Ltd. (South Korea) )
  • Baek, S. H. ( DuPont Photomasks Korea Ltd. (South Korea) )
  • Kim, L. J. ( DuPont Photomasks Korea Ltd. (South Korea) )
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
220
Page(to):
233
Pages:
14
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-1
Type:
Conference Proceedings

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