Evaluation of a new-generation photomask develop system for CAR
- Author(s):
Cantrell, R. ( Advanced Mask Technology Ctr. (Germany) ) Tschinkl, M. ( Advanced Mask Technology Ctr. (Germany) ) Feicke, A. ( Advanced Mask Technology Ctr. (Germany) ) Porsche, W. ( Advanced Mask Technology Ctr. (Germany) ) Lee, G. ( Advanced Mask Technology Ctr. (Germany) ) Kotoda, T. ( Tokyo Electron Deutschland GmbH (Germany) ) Tichy, P. ( Tokyo Electron Deutschland GmbH (Germany) ) Fukai, T. ( Tokyo Electron Ltd. (Japan) ) Kamei, S. ( Tokyo Electron Ltd. (Japan) ) Asai, H. ( Tokyo Electron Ltd. (Japan) ) - Publication title:
- 24th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5567
- Pub. Year:
- 2004
- Page(from):
- 190
- Page(to):
- 200
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455130 [081945513X]
- Language:
- English
- Call no.:
- P63600/5567-1
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
First photomask developer based on state-of-the-art wafer processing technology
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Comparison of new film nozzle with standard nozzle for aqueous puddle developing of photomasks
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
A study of post-exposure baking effect for CAR process in photomask fabrication
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Evaluation of reticle cleaning performance with different drying methods for high-grade photomasks
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Integration and optimization of the DUV ALTA pattern generation system using a CAR process with the Tetra photomask etch system
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Reduce process bias of photomask manufacturing for next-generation lithography
SPIE - The International Society of Optical Engineering |