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Design, mask, and manufacturability

Author(s):
Ma, M. ( Texas Instruments Inc. (USA) )
Hong, H. ( Texas Instruments Inc. (USA) )
Choi, Y. S. ( Texas Instruments Inc. (USA) )
Ho, C. -C. ( Texas Instruments Inc. (USA) )
Mason, M. ( Texas Instruments Inc. (USA) )
McKee, R. ( Texas Instruments Inc. (USA) )
1 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
137
Page(to):
146
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-1
Type:
Conference Proceedings

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