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Wavelength-dependent spot defects on advanced embedded attenuated phase-shift masks

Author(s):
Magg, C. K. ( IBM Corp. (USA) )
Benz, J. M. ( IBM Corp. (USA) )
Kindt, L. ( IBM Corp. (USA) )
Smith, A. C. ( IBM Corp. (USA) )
Burnham, J. ( IBM Corp. (USA) )
Riendeau, J. ( IBM Corp. (USA) )
Johnson, C. ( IBM Corp. (USA) )
Kontra, R. ( IBM Corp. (USA) )
3 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
72
Page(to):
80
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-1
Type:
Conference Proceedings

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