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Phase defect printability and mask inspection capability of 65-nm technology node Alt-PSM for ArF lithography (Photomask Japan Best Paper)

Author(s):
Akima, S. ( Toppan Printing Co., Ltd. (Japan) )
Komizo, T. ( Toppan Printing Co., Ltd. (Japan) )
Kawakita, S. ( Toppan Printing Co., Ltd. (Japan) )
Kodera, Y. ( Toppan Printing Co., Ltd. (Japan) )
Narita, T. ( Toppan Printing Co., Ltd. (Japan) )
Ishikawa, K. ( Sony Corp. (Japan) )
1 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
23
Page(to):
35
Pages:
13
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-1
Type:
Conference Proceedings

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