Recent progress of EUV wavefront metrology in EUVA
- Author(s):
Hasegawa, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Ouchi, C. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Hasegawa, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Kato, S. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Ohkubo, A. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Suzuki, A. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Sugisaki, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Okada, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Otaki, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Murakami, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Saito, J. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Niibe, M. ( Univ. of Hyogo (Japan) ) Takeda, M. ( Univ. of Electro-Communications (Japan) ) - Publication title:
- Advances in mirror technology for X-ray, EUV lithography, laser, and other applications II : 5 August 2004, Denver, Colorado, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5533
- Pub. Year:
- 2004
- Page(from):
- 27
- Page(to):
- 36
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819454713 [0819454710]
- Language:
- English
- Call no.:
- P63600/5533
- Type:
- Conference Proceedings
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