A new simulated annealing algorithm applied to the design of diffractive optical elements used in uniform illumination

A new simulated annealing algorithm applied to the design of diffractive optical elements used in uniform illumination

Author(s):

Liu, H. ( Univ. of Science and Technology of China (China) )
Zhao, Y. ( Univ. of Science and Technology of China (China) )
Li, Y. -P. ( Univ. of Science and Technology of China (China) )

Publication title:

Laser Beam Shaping V

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5525

Pub. Year:

2004

Page(from):

217

Page(to):

225

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819454638 [081945463X]

Language:

English

Call no.:

P63600/5525

Type:

Conference Proceedings

Details

TDL ID:	ZA00014726
Series ID:	PA00000029
Conf. info. (Name):	Optics & Photonics : Laser Beam Shaping
Conf. info. (Number):	2004 : 5th
Conf. info. (Venue):	Denver, CO, USA
Conf. info. (Date):	2004.08.05

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