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339 High-efficiency photoresist grating at 1.55 μm for DWDM application

Author(s):
  • Zhang, Y. ( Shanghai Institute of Optics and Fine Mechanics (China) )
  • Zhou, C. ( Shanghai Institute of Optics and Fine Mechanics (China) )
  • Ru, H. ( Shanghai Institute of Optics and Fine Mechanics (China) )
Publication title:
Current developments in lens design and optical engineering V : 4-5 August 2004, Denver, Colorado, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5523
Pub. date:
2004
Page(from):
339
Page(to):
343
Pages:
5
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819454614 [0819454613]
Language:
English
Call no.:
P63600/5523
Type:
Conference Proceedings

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