Measurement results on after-etch resist coated features on the new Leica Microsystems' LWM270 DUV critical dimension metrology system
- Author(s):
- Whittey, J. M. ( Leica Microsystems, Inc. (USA) )
- Steinberg, W. ( Leica Microsystems GmbH(Germany) )
- Publication title:
- 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5504
- Pub. Year:
- 2004
- Page(from):
- 19
- Page(to):
- 25
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819454379 [0819454370]
- Language:
- English
- Call no.:
- P63600/5504
- Type:
- Conference Proceedings
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