Emission spectra of laser-produced plasmas for EUV and soft x-ray sources

Emission spectra of laser-produced plasmas for EUV and soft x-ray sources

Author(s):

Soumagne, G. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Abe, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Ikeda, K. ( Graduate Univ. for Advanced Studies (Japan) )

Komori, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Someya, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Suganuma, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Nakajima, K. ( Graduate Univ. for Advanced Studies (Japan) and High Energy Accelerator Research Organization (Japan) )

Endo, A. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

3 more

Publication title:

Laser Optics 2003: Superintense Light Fields and Ultrafast Processes

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5482

Pub. Year:

2004

Page(from):

26

Page(to):

31

Pages:

6

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819454126 [0819454125]

Language:

English

Call no.:

P63600/5482

Type:

Conference Proceedings

Details

TDL ID:	ZA00014673
Series ID:	PA00000029
Conf. info. (Name):	Laser Optics
Conf. info. (Number):	2003
Conf. info. (Venue):	St. Petersburg, Russia
Conf. info. (Date):	2003.06.30-2003.07.04

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