Characterization of waferstepper and process related front- to backwafer overlay errors in bulk micromachining using electrical overlay test structures
- Author(s):
- van Zeijl, H. W. ( Technische Univ. Delft (Netherlands) )
- Bijnen, F. G. C. ( ASML (Netherlands) )
- Slabbekoorn, J. ( Technische Univ. Delft (Netherlands) )
- Publication title:
- MEMS, MOEMS, and Micromachining
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5455
- Pub. Year:
- 2004
- Page(from):
- 398
- Page(to):
- 406
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453785 [0819453781]
- Language:
- English
- Call no.:
- P63600/5455
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Characterization of front- to backwafer alignment and bulk micromachining using electrical overlay test structures
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Backwafer optical lithography and wafer distortion in substrate transfer technologies
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Electrical and environmental reliability characterization of surface-micromachined MEMS polysilicon test structures
SPIE-The International Society for Optical Engineering |
Materials Research Society |
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
10
Conference Proceedings
16 Electrical characterization of silicon diodes formed by laser annealing of implanted dopants
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Investigation of thermopile using CMOS compatible process and front-side Si bulk etching
SPIE-The International Society for Optical Engineering |