Fabrication of diffractive optical elements with grayscale photo-lithography
- Author(s):
Kim, W. -C. ( Yonsei Univ (South Korea) ) Lee, M. ( Samsung Advanced Institute of Technology (South Korea) ) Sohn, J. ( Samsung Advanced Institute of Technology (South Korea) ) Cho, E. ( Samsung Advanced Institute of Technology (South Korea) ) Yoon, C. ( Yonsei Univ. (South Korea) ) Park, N. ( Yonsei Univ. (South Korea) ) Park, Y. ( Yonsei Univ. (South Korea) ) - Publication title:
- Optical data storage 2004 : 18-21 April 2004, Monterey, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5380
- Pub. Year:
- 2004
- Page(from):
- 686
- Page(to):
- 696
- Pages:
- 11
- Pub. info.:
- Bellingham: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452931 [0819452939]
- Language:
- English
- Call no.:
- P63600/5380
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Evaluation of lens aberrations depending on the transmittance of DUV-attenuated PSM
SPIE - The International Society for Optical Engineering |
2
Conference Proceedings
Optical performance evaluation of hybrid micro lens with NA 0.85 for small form factor optical pickup [5966-74]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Development of integrated optical pickup for small form factor optical disc drive (Invited Paper) [6282-06]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Spatial optical modulator (SOM): high-density diffractive laser projection display
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Practical methodology of optical proximity correction in subquarter-micron lithography
SPIE - The International Society for Optical Engineering |
11
Conference Proceedings
Patterning with spacer for expanding the resolution limit of current lithography tool [6156-27]
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Fully optical backplane system using novel optical plug aand slot [6014-19]
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Fabrication of multilevel reflective diffractive optical elements by means of laser ablation lithography
SPIE - The International Society of Optical Engineering |