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Development of focused ion-beam repair for opaque defects on MoSi-based attenuated phase-shift mask

Author(s):
Nishida, N. ( HOYA Corp. (Japan) )
Nishio, Y. ( HOYA Corp. (Japan) )
Kinoshita, H. ( HOYA Corp. (Japan) )
Takaoka, O. ( Seiko Instruments Inc. (Japan) )
Kozakai, T. ( Seiko Instruments Inc. (Japan) )
Aita, K. ( Seiko Instruments Inc. (Japan) )
1 more
Publication title:
Photomask and X-Ray Mask Technology VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3748
Pub. Year:
1999
Page(from):
599
Page(to):
608
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819432308 [081943230X]
Language:
English
Call no.:
P63600/3748
Type:
Conference Proceedings

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