New UV-capable photomask CD metrology tool

New UV-capable photomask CD metrology tool

Author(s):

Schlueter, G. ( Leica Microsystems Wetzlar GmbH (Germany) )

Brueck, H. -J. ( MueTec GmbH (Germany) )

Birkenmayer, S. ( MueTec GmbH (Germany) )

Falk, G. ( MueTec GmbH (Germany) )

Scheuring, G. ( MueTec GmbH (Germany) )

Walden, L. ( MueTec GmbH (Germany) )

Lehnigk, S. ( Submicron Technologies GmbH (Germany) )

2 more

Publication title:

Photomask and X-Ray Mask Technology VI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3748

Pub. Year:

1999

Page(from):

592

Page(to):

598

Pages:

7

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819432308 [081943230X]

Language:

English

Call no.:

P63600/3748

Type:

Conference Proceedings

Details

TDL ID:	ZA00014623
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next Generation Lithography Mask Technology : Photomask and X-Ray Mask Technology
Conf. info. (Number):	1999 : 6th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	1999.04.13-1999.04.14

Similar Items:

1 Conference Proceedings Results from submicron CD metrology obtained with new I-line tools Bruck,H.-J., Birkenmayer,S., Falk,G., Scheuring,G., Walden,L., Lehnigk,S. SPIE - The International Society for Optical Engineering	7 Conference Proceedings Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec (M5k) DUV tool Scheuring, G., Petrashenko, A., Doebereiner, S., Hillmann, F., Brucek, H.-J., Hourd, A.C., Grimshaw, A., Hughes, G., … SPIE-The International Society for Optical Engineering
2 Conference Proceedings CD metrology on OPC features using light optical and electron optical tools Schaetz,T., Doebereiner,S., Scheuring,G., Brueck,H.-J. SPIE-The International Society for Optical Engineering	8 Conference Proceedings A new life for a 10-year old MueTec2010 CD measurement system: the ultimate precision upgrade with additional film thickness measurement capability [6281-17] Cassol, L. G., Bianucci, G., Murai, S., Falk, G., Scheuring, G., Dobereiner, S., Bruck, -J. H. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Major improvements in mask CD metrology:enhanced performance on attenuated phase-shift masks,corner rounding measurements,and improved measurement automation Schluter,G., Scheuring,G., Falk,G., Bruck,H.-J., Schatz,T., Lehnigk,S. SPIE - The International Society for Optical Engineering	9 Conference Proceedings DUV water immersion technology extends linearity: first results from the new 65nm node CD metrology system LWM500 WI Hillmann, F., Dobereiner, S., Gittinger, C., Reiter, R., Falk, G., Bruck, H.-J., Scheuring, G., Bosser, A., Heiden, M., … SPIE - The International Society of Optical Engineering
4 Conference Proceedings Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment Jonckheere, R.M., Philipsen, V., Scheuring, G., Hillmann, F., Brueck, H.-J., Ordynskyy, V., Peter, K., Hourd, A.C., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Performance data of a new 248-nm CD metrology tool proved on COG reticles and PSMs Schlueter,G., Steinberg,W., Whittey,J. SPIE-The International Society for Optical Engineering
5 Conference Proceedings New approach for defect inspection on large area masks G. Scheuring, S. Doebereiner, F. Hillmann, G. Falk, H. Brueck SPIE - The International Society of Optical Engineering	11 Conference Proceedings New results from DUV water immersion microscopy using the CD metrology system LWM500 WI with a high NA condenser F. Hillmann, G. Scheuring, H.-J. Brück Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings First results from a new 248-nm CD measurement system for future mask and reticle generation Schluter,G., Scheuring,G., Helbing,J., Lehnigk,S., Bruck,H.-J. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Implementation of 248-nm based CD metrology for advanced reticle production Hourd, A.C., Grimshaw, A., Scheuring, G., Gittinger, C., Doebereiner, S., Hillmann, F., Brueck, H.-J., Hartmann, H., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12