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Impact of mask CD error on wafer CD error at low-k1 photolithography

Author(s):
Kim, B. -G. ( Samsung Electronics Co., Ltd. (Korea) )
Choi, S. -W. ( Samsung Electronics Co., Ltd. (Korea) )
Choi, J. -H. ( Samsung Electronics Co., Ltd. (Korea) )
Chun, C. -U. ( Samsung Electronics Co., Ltd. (Korea) )
Yoon, H. -S. ( Samsung Electronics Co., Ltd. (Korea) )
Sohn, J. -M. ( Samsung Electronics Co., Ltd. (Korea) )
1 more
Publication title:
Photomask and X-Ray Mask Technology VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3748
Pub. Year:
1999
Page(from):
572
Page(to):
578
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819432308 [081943230X]
Language:
English
Call no.:
P63600/3748
Type:
Conference Proceedings

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