Advanced electron-beam writing system EX-11 for next-generation mask fabrication
- Author(s):
Tojo, T. ( Toshiba Corp. (Japan) ) Yoshikawa, R. ( Toshiba Corp. (Japan) ) Ogawa, Y. ( Toshiba Corp. (Japan) ) Tamamushi, S. ( Toshiba Corp. (Japan) ) Hattori, Y. ( Toshiba Corp. (Japan) ) Koikari, S. ( Toshiba Corp. (Japan) ) Kusakabe, H. ( Toshiba Corp. (Japan) ) Abe, T. ( Toshiba Corp. (Japan) ) Ogasawara, M. ( Toshiba Corp. (Japan) ) Akeno, K. ( Toshiba Corp. (Japan) ) Anze, H. ( Toshiba Corp. (Japan) ) Hattori, K. ( Toshiba Corp. (Japan) ) Hirano, R. ( Toshiba Corp. (Japan) ) Yoshitake, S. ( Toshiba Corp. (Japan) ) Iijima, T. ( Toshiba Corp. (Japan) ) Ohtoshi, K. ( Toshiba Corp. (Japan) ) Matsuki, K. ( Toshiba Corp. (Japan) ) Shimomura, N. ( Toshiba Corp. (Japan) ) Yamada, N. ( Toshiba Corp. (Japan) ) Higurashi, H. ( Toshiba Corp. (Japan) ) Nakayamada, N. ( Toshiba Corp. (Japan) ) Fukudome, Y. ( Toshiba Corp. (Japan) ) Hara, S. ( Toshiba Corp. (Japan) ) Murakami, E. ( Toshiba Corp. (Japan) ) Kamikubo, T. ( Toshiba Corp. (Japan) ) Suzuki, Y. ( Toshiba Corp. (Japan) ) , ( Toshiba Machine Co., Ltd. (Japan) ) Oogi, S. ( Toshiba Corp. (Japan) ) Shimizu, M. ( Toshiba Corp. (Japan) ) Nishimura, S. ( Toshiba Corp. (Japan) ) Tsurumaki, H. ( Toshiba Corp. (Japan) ) Yasuda, S. ( Toshiba Corp. (Japan) ) Ooki, K. ( Toshiba Corp. (Japan) ) Koyama, K. ( Toshiba Corp. (Japan) ) Watanabe, S. ( Toshiba Corp. (Japan) ) Yano, M. ( Toshiba Corp. (Japan) ) Suzuki, H. ( Toshiba Corp. (Japan) ) Hoshino, H. ( Toshiba Machine Co., Ltd. (Japan) ) Toriumi, M. ( Toshiba Machine Co., Ltd. (Japan) ) Watanabe, O. ( Toshiba Machine Co., Ltd. (Japan) ) Tsuji, K. ( Toshiba Machine Co., Ltd. (Japan) ) Katayama, M. ( Toshiba Machine Co., Ltd. (Japan) ) Tsuchiya, S. ( Toshiba Machine Co., Ltd. (Japan) ) Suzuki, K. ( Toshiba Machine Co., Ltd. (Japan) ) Kurasawa, S. ( Toshiba Machine Co., Ltd. (Japan) ) Okuzono, K. ( Toshiba Machine Co., Ltd. (Japan) ) Yamada, H. ( Toshiba Machine Co., Ltd. (Japan) ) Handa, K. ( Toshiba Machine Co., Ltd. (Japan) ) Akiyama, T. ( Toshiba Machine Co., Ltd. (Japan) ) Tada, Y. ( Toshiba Machine Co., Ltd. (Japan) ) Noma, A. ( Toshiba Machine Co., Ltd. (Japan) ) Takigawa, T. ( Toshiba Corp. (Japan) ) - Publication title:
- Photomask and X-Ray Mask Technology VI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3748
- Pub. Year:
- 1999
- Page(from):
- 416
- Page(to):
- 425
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819432308 [081943230X]
- Language:
- English
- Call no.:
- P63600/3748
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Reduction of fogging effect caused by scattered electrons in an electron beam system
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Pattern-data preparation method to enchance high-throughput mask fabrication in variable-shaped e-beam writing system
SPIE-The International Society for Optical Engineering |