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Fabrication of MoSiON halftone masks using ZEP7000 for MEBES 4500

Author(s):
Maetoko, K. ( Mitsubishi Electric Corp. (Japan) )
Tange, K. ( Mitsubishi Electric Corp. (Japan) )
Fukuma, H. ( Ryoden Semiconductor System Engineering Corp. (Japan) )
Yoshioka, N. ( Mitsubishi Electric Corp. (Japan) )
Kawada, S. ( Ulvac Coating Corp. (Japan) )
Ishizuka, M. ( Ulvac Coating Corp. (Japan) )
Sasaki, T. ( Ulvac Coating Corp. (Japan) )
Sauer, C. A. ( Etec Systems, Inc. (USA) )
3 more
Publication title:
Photomask and X-Ray Mask Technology VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3748
Pub. date:
1999
Page(from):
350
Page(to):
357
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819432308 [081943230X]
Language:
English
Call no.:
P63600/3748
Type:
Conference Proceedings

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