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ICP (inductively coupled plasma) dry etch of DUV MoSi HTPSM

Author(s):
Lee, K. Y. ( DuPont Photomasks Korea Ltd. )
Kim, L. J. ( DuPont Photomasks Korea Ltd. )
Nam, K. -H. ( DuPont Photomasks Korea Ltd. )
Park, K. T. ( DuPont Photomasks Korea Ltd. )
Ku, Y. M. ( Hyundai Electronics (Korea) )
Ku, S. S. ( Hyundai Electronics (Korea) )
Hur, I. B. ( Hyundai Electronics (Korea) )
2 more
Publication title:
Photomask and X-Ray Mask Technology VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3748
Pub. date:
1999
Page(from):
158
Page(to):
165
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819432308 [081943230X]
Language:
English
Call no.:
P63600/3748
Type:
Conference Proceedings

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