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Manufacturability of a 0.18-μm OPC technology

Author(s):
Hsieh, R. G. ( Taiwan Semiconductor Manufacturing Co., Ltd. )
Lin, H. T. ( Taiwan Semiconductor Manufacturing Co., Ltd. )
Lin, J. C. H. ( Taiwan Semiconductor Manufacturing Co., Ltd. )
Yen, A. ( Taiwan Semiconductor Manufacturing Co., Ltd. )
Yoo, C. S. ( Taiwan Semiconductor Manufacturing Co., Ltd. )
Wang, J. J. ( Taiwan Semiconductor Manufacturing Co., Ltd. )
1 more
Publication title:
Photomask and X-Ray Mask Technology VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3748
Pub. Year:
1999
Page(from):
19
Page(to):
26
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819432308 [081943230X]
Language:
English
Call no.:
P63600/3748
Type:
Conference Proceedings

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