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Advanced high-resolution mask processes using optical proximity correction (Invited Paper)

Author(s):
Chan, Y. D. ( Photronics, Inc. (USA) )  
Publication title:
Photomask and X-Ray Mask Technology VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3748
Pub. Year:
1999
Page(from):
11
Page(to):
18
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819432308 [081943230X]
Language:
English
Call no.:
P63600/3748
Type:
Conference Proceedings

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