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Advanced metal lift-off process using electron-beam flood exposure of single-layer photoresist

Author(s):
Minter, J. P. ( AlliedSignal Inc. )
Ross, M. F. ( AlliedSignal Inc. )
Livesay, W. R. ( AlliedSignal Inc. )
Wong, S. S. ( AlliedSignal Inc. )
Narcy, M. E. ( AlliedSignal Inc. )
Marlowe, T. ( AlliedSignal Inc. )
1 more
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
1074
Page(to):
1082
Pages:
9
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-2
Type:
Conference Proceedings

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