Blank Cover Image

Characterizing acid mobility in chemically amplified resists via spectroscopic methods

Author(s):
Jessop, J. L. P. ( Michigan State Univ. )
Goldie, S. N. ( Michigan State Univ. )
Scranton, A. B. ( Michigan State Univ. )
Blanchard, G. J. ( Michigan State Univ. )
Rangarajan, B. ( Advanced Micro Devices, Inc. )
Capodieci, L. ( Advanced Micro Devices, Inc. )
Subramanian, R. ( Advanced Micro Devices, Inc. )
Templeton, M. K. ( Advanced Micro Devices, Inc. )
3 more
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
914
Page(to):
922
Pages:
9
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-2
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Spectroscopic characterization of acid mobility in chemically amplified resists

Jessop,J.L.P., Goldie,S.N., Scranton,A.B., Blanchard,G.J., Rangarajan,B., Okoroanyanwu,U., Subramanian,R., …

SPIE - The International Society for Optical Engineering
7 Conference Proceedings Acid diffusion and evaporation in chemically amplified resists

Kim, J. -B., Kwon, Y. -G., Choi, J. -H., Jung, M. -H.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Characterizing Acid Mobility in Chemically Amplified Resists via Spectroscopic Methods

Blanchard, Gary J., Goidie, Scott N., Jessop, Julie L.P., Scranton, Alec B.

American Institute of Chemical Engineers
8 Conference Proceedings Optimization of DUV chemically amplified resist platforms for SCALPEL e-beam exposure

Ocola,L.E., Blakey,M.I., Orphanos,P.A., Li,W.-Y., Novembre,A.E., Brainard,R.L., Mackevich,J.F., Taylor,G.N.

SPIE - The International Society for Optical Engineering
3 Conference Proceedings Optimal sampling strategies for sub-100-nm overlay

Rangarajan,B., Templeton,M.K., Capodieci,L., Subramanian,R., Scranton,A.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Resist composition effects on ultimate resolution of negative-tone chemically amplified resists

Pain,L., Gourgon,C., Patterson,K., Scarfogliere,B., Tedesco,S.V., Fanget,G.L., Dal'Zotto,B., Ribeiro,M., Kusumoto,T., …

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Physically based model for predicting volume shrinkage in chemically amplified resists

Jakatdar,N.H., Bao,J., Spanos,C.J., Subramanian,R., Rangarajan,B., Romano,A.R.

SPIE - The International Society for Optical Engineering
10 Conference Proceedings Modeling chemically amplified resists for 193-nm lithography

Croffie,E.H., Cheng,M., Neureuther,A.R., Houlihan,F.M., Cirelli,R.A., Sweeney,J.R., Dabbagh,G., Watson,G.P., …

SPIE - The International Society for Optical Engineering
5 Conference Proceedings Acid mobility in chemically amplified photoresists

Stewart, M.D., Becker, D.J., Stachowiak, T.B., Schmid, G.M., Michaelson, T.B., Tran, H.V., Willson, C.G.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Polymer design for 157-nm chemically amplified resists

Ito,H., Wallraff,G.M., Brock,P.J., Fender,N., Truong,H.D., Breyta,G., Miller,D.C., Sherwood,M.H., Allen,R.D.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Experimental method for quantifying acid diffusion in chemically amplified resists

Wallraff, G. M., Hinsberg, W. D., Houle, F. A., Morrison, M. D., Larson, C. E., Sanchez, M, I., Hoffnagle, J. A., Brock, …

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Acid evaporation property in chemically amplified resists

Hashimoto,S., Itani,T., Yoshino,H., Yamana,M., Samoto,N., Kasama,K.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12