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Non-chemically amplified 193-nm top surface imaging photoresist development: polymer substituent and polydispersity effects

Author(s):
Kim, M. -S. ( Hyundai Electronics Industries Co., Ltd. (Korea) )
Kim, H. -G. ( Hyundai Electronics Industries Co., Ltd. (Korea) )
Kim, H. -S. ( Hyundai Electronics Industries Co., Ltd. (Korea) )
Baik, K. -H. ( Hyundai Electronics Industries Co., Ltd. (Korea) )
Johnson, D. W. ( MicroChem Corp. )
Cernigliaro, G. J. ( Advanced Nanotechnologies, Inc. )
Minsek, D. W. ( MicroChem Corp. )
2 more
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
891
Page(to):
901
Pages:
11
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-2
Type:
Conference Proceedings

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